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Mask Aligner@j|RPPorPOO |
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Light source & exposure unit |
USHIO multi-light hi Ultra high presssure mercury
lamp
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Exposure area |
100mm |
Main wave length |
II type or IG type |
Light intensity |
25mW/cu more |
Uniformity |
}5% or less |
Parallelism |
}Por less |
Mask holder |
will discuss |
Nicroscope lamp house |
Coaxial revolution displacement (manual) |
X,Y axes displacement |
10mm@500m/turn |
Z axis displacement |
10mm |
axis displacement |
10 |
Negative mask and sample simultaneous displacement |
100mm displacement on X,Y axes, 2mm/turn |
Exposure time |
0.1`999.9sec@ |
ON/OFF delay timer for lamp cooling fan |
ON=slow ventilation at the first stage when mercury lamp is lit,
0`5min OFF=cooling after mercury lamp has gone off, 0`30min |
Dimension |
W 730~D 530~H 850mm |
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OPTION |
Microscope |
SMZ800iwith coaxial lightj@15~`94.5~ zoom |
SMZ1000iwith coaxial lightj@54~`540~ zoom |
Twp-view Microscopeiwith coaxial lightj@100~,200~ |
Vacuum Pump |
DA-30S(Ultimate pressure 200 Torr) |
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Kyowa Riken Co., Ltd. |
3-37-3 Izumi, Suginami-Ku, Tokyo 168-0063, Japan TEL@ORiRRQPjXXPP@@FAX@ORiRRQPjXXPV E-MAIL:sales@kyowariken.co.jp |
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